Tag: Patent Approval

Lumetrics Obtains Patent for Wavefront Sensor Contact Lens Measurement System

Lumetrics was awarded a patent for an apparatus that measures the optical performance characteristics and dimensions of an optical element using a Shack-Hartmann wavefront sensor and a low coherence interferometer. This is a major improvement on current manufacturing inspection methods, especially for the contact lens and intraocular lens industries. Read More

Lumetrics, Inc. Axial Length Patent Approved, Will Advance Patient Care in Ocular Health

Rochester, NY- February 23, 2011- Lumetrics, Inc., a leading manufacturer of world-class precision thickness measurement technology has received patent approval for their newest technology for evaluating internal structure of human eye. The United States Patent #7884946 is titled “Apparatus for Measurement of the Axial Length of an eye.” With the U.S. population of over 65… Read more »